포토레지스트

Posi PR

포토레지스트(Photoresist, PR)는 빛에 반응(감광)하여 특성이 변하는 화학물질로, 디스플레이에서는 TFT(박막트랜지스터)에
미세한 회로를 형성하는 포토리소그래피(Photolithography)공정에 사용되는 핵심 재료입니다.

  • Key Features
    • Stable Half-Tone (4-mask) Patterning Properties
    • LTPS Process Compatibility with No Particle Defect
    • High Resolution and Adhesion
    • Various Wavelengths Applied PR (G-line, I-line)
    • Very Low Turbity
    Figure. Root cause of particle generation
    PAC shows vary stable state when exist hydrogen bonding of Novolak & PAC
    But, normal LCD PAC have strong steric hindrance, so easily broking hydrogen bonding of Novolak & PAC, and making particle
  • Table. Resolution of
    COTEM LCD & Oxide photoresist
    Table. Resolution of COTEM LCD & Oxide photoresist image
    Table. 4um Hole thermal stability of
    COTEM LCD & Oxide photoresist
    4um Hole thermal stability of <br>COTEM LCD & Oxide photoresist image
  • Table. Resolution of COTEM LTPS PR
    Table. Resolution of COTEM LTPS PR image
    관련제품군
    • LTP5
    • 4Mask, 5Mask
    • High Resolution

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